The applications of FESEM include:
-
1
Semiconductor device cross section analyses for gate widths, gate oxides, film thicknesses, and construction details.
-
2
Advanced coating thickness and structure uniformity determination.
-
3
Small contamination feature geometry and elemental composition measurement.
-
1
Powder
-
2
Film
-
3
Solid
-
4
Dry
All enquiries please contact:
MOHAMAD HASNUL NAIM ABD. HAMID
B.Sc. (UKM) Biochemistry
Email : hasnul@ukm.edu.my
Contact Number : 03-8911 8513
Location : Level 3, i-CRIM Centralised Lab, Centre for Research and Instrumentation Management (CRIM), Research Complex UKM
Email : hasnul@ukm.edu.my
Contact Number : 03-8911 8513
Location : Level 3, i-CRIM Centralised Lab, Centre for Research and Instrumentation Management (CRIM), Research Complex UKM