Sains Malaysiana 47(2)(2018): 393-402

http://dx.doi.org/10.17576/jsm-2018-4702-22

 

Effect of Nickel Catalyst Layer Thickness and Grain Size Prepared by Electroplating Method to the Growth of Carbon Nanostructures by Chemical Vapour Deposition

(Kesan terhadap Ketebalan Lapisan dan Saiz Bijian Pemangkin Nikel Disedia dengan Kaedah Sadur Elektrik pada Pertumbuhan Karbon Nanostruktur melalui Kaedah Pemendapan Wap Kimia)

 

Roszaini Md Salleh¹, Wei-Ming Yeoh², Abdul Rahman Mohamed¹* & Raihana Bahru¹

 

¹School of Chemical Engineering, Universiti Sains Malaysia, 14300 Nibong Tebal, Pulau Pinang, Malaysia

 

²Department Petrochemical Engineering, Faculty of Engineering and Green Technology, Universiti Tunku Abdul Rahman, Jalan Universiti, Bandar Barat, 31900 Kampar, Perak Darul Ridzuan, Malaysia

 

Diserahkan: 26 Mac 2017/Diterima: 17 Ogos 2017

 

 

ABSTRACT

A simple method of growing carbon nanostructures (CNS), a mixture of carbon nanotube (CNT) and carbon nanofiber (CNF), directly on a nickel catalyst layer electroplated on the copper substrate at low reaction temperature and atmospheric pressure via chemical vapor deposition (CVD) was investigated in this study. The nickel catalyst was prepared using electroplating methods and the current density was varied to give the nickel catalyst layer with different thicknesses and grain sizes prior to the growth of CNS which was carried out at 600°C and under a mixture of 25 sccm: 100 sccm of acetylene to nitrogen for 40 min. A nickel catalyst layer electroplated at 1 mA/cm², which possess a smaller grain size and thinner layer of nickel catalyst, enables the synthesis of high quality and dense CNS as well as high ratio of CNT over CNF.    

Keywords: Carbon nanostructures; chemical vapor deposition (CVD); electroplating; nickel catalyst layer

 

ABSTRAK

Kaedah mudah untuk pertumbuhan terus nanostruktur karbon adalah gabungan antara nanotiub karbon dan nanoserabut karbon di atas substrat kuprum terelektrosadur lapisan nikel pada suhu tindak balas yang rendah dan tekanan atmosfera dikaji dalam penyelidikan ini. Pemangkin nikel disediakan dengan menggunakan kaedah elektropenyaduran dan ketumpatan arus yang berlainan, bagi menghasilkan lapisan pemangkin nikel dengan ketebalan dan saiz bijirin yang berbeza. Pertumbuhan terus CNS melalui kaedah pemendapan wap kimia (CVD) di atas elektrosadur lapisan pemangkin nikel telah dijalankan pada suhu tindak balas 600°C dengan campuran 25 kepada 100 sccm bagi kadar pengaliran asetilena kepada nitrogen selama 40 minit. Lapisan pemangkin nikel elektrosadur pada ketumpatan arus paling rendah mengandungi saiz bjirin yang kecil dan ketebalan lapisan pemangkin nikel yang nipis menghasilkan pertumbuhan CNS yang berkualiti dan tumpat di samping nisbah CNT yang tinggi berbanding CNF.  

Kata kunci: Elektropenyaduran; nanostruktur karbon; pemangkin nikel; pemendapan wap kimia

 

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*Pengarang untuk surat-menyurat; email: chrahman@usm.my