PLM-100-Photoluminescence-Mapping-Tool

Philips-PLM-100-Photoluminescence-Mapping-Tool (PLM-100)

A Phillips PLM-100 Photoluminescene system is utilized for epitaxial material analysis. The main research parameters that can be measured include multilayer thickness, multilayer band gap, ternary composition analysis, crystal perfection analysis, reflective VCSEL structures and Bragg analysis. Together with XRD rocking curve data, this system will enable quaternary alloy composition analysis.

We provide sample characterization service
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