Thermal / E-beam evaporator for thinfilm deposition
This is a 2 in 1 thermal and E-beam evaporator system
The ebeam gun power is 3 kW and the thermal power is 2kW.
The substrate holder is rotatable.
The big chamber area allows a 4 inches wafer to be placed into it.
For thermal evaporator, we are current working on materials such as Aluminum (Al), Silver (Ag), Copper (Cu) etc.
Customer can bring in their own source materials upon discussion with us.
If you need sample processing using this equipment,
Please kindly contact us.
Email address: laboratory.equipment.manager(a)gmail.com