The Hitachi Ethos NX5000 is a high-performance microscopy system that combines Focused Ion Beam (FIB) and Scanning Electron Microscope (SEM) technologies into a single platform. This system is used for nanoscale material analysis and processing with very high precision. By integrating these two technologies, this instrument can cut, modify and simultaneously observe the internal structure of samples in great detail. The Ethos NX5000 also provides high-resolution imaging, fast processing speed and the capability to prepare samples for Transmission Electron Microscopy (TEM). In addition, it includes advanced features such as triple-beam technology using Argon Ion and anti-curtaining which help produce smoother sample surfaces and reduce damage during processing. Therefore, it is widely used in fields such as semiconductors, nanotechnology, materials science and biomedical research.